N-Type SiC air Si Substrates Composite Dia6inch
等级Ìre | U 级 | P级 | D级 |
Ìre ìosal BPD | Ìre toraidh | Ìre Dummy | |
uainTrast-thomhas | 150.0 mm±0.25mm | ||
厚度Tigheadas | 500 μm±25μm | ||
晶片方向Treòrachadh Wafer | Far an axis: 4.0° a dh’ionnsaigh <11-20> ±0.5° airson 4H-N Air an axis: <0001>±0.5° airson 4H-SI | ||
Luchdaich sìosFlat bun-sgoile | {10-10}±5.0° | ||
Luchdaich sìosFad Flat Bun-sgoile | 47.5 mm±2.5 mm | ||
ughÀs-dùnadh Edge | 3 mm | ||
总厚度变化/弯曲 度/翘曲 度 TTV/Bow /Warp | ≤15μm / ≤40μm / ≤60μm | ||
微管密度和基面位错MPD&BPD | MPD≤1 cm-2 | MPD≤5 cm-2 | MPD≤15 cm-2 |
BPD≤1000cm-2 | |||
电阻率Resistivity | ≥1E5 Ω·cm | ||
表面粗糙度Garbhachd | Pòlainnis Ra≤1 nm | ||
CMP Ra≤0.5 nm | |||
裂 纹(强光灯观测) # | Chan eil gin | Faid tionalach ≤10mm, fad singilte≤2mm | |
Sgàinidhean le solas àrd dian | |||
六方空洞(强光灯观测)* | Raon cruinnichte ≤1% | Raon cruinnichte ≤5% | |
Plataichean hex le solas àrd dian | |||
seadh(强光灯观测)* | Chan eil gin | Raon cruinnichte≤5% | |
Sgìrean polytype le solas àrd dian | |||
seadh(强光灯观测)*& | 3 sgrìoban gu trast-thomhas wafer 1 × | 5 sgrìoban gu trast-thomhas wafer 1 × | |
A ’sgrìobadh le solas àrd dian | fad cruinn | fad cruinn | |
ugh# Edge chip | Chan eil gin | 5 ceadaichte, ≤1 mm gach | |
表面污染物(强光灯观测) | Chan eil gin | ||
Truailleadh le solas àrd dian |